Many new technologies, products make debut during 2nd CIIE in Shanghai

Source: Xinhua| 2019-11-06 18:18:18|Editor: Li Xia

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(CIIE)CHINA-SHANGHAI-CIIE-NEW TECHNOLOGY AND PRODUCT-DEBUT (CN)

New cut-resistant gloves developed by U.S. DuPont are unveiled at the product launching center of the second China International Import Expo (CIIE) in Shanghai, east China, Nov. 6, 2019. Many new technologies and products made debut during the second CIIE held in Shanghai. (Xinhua/Jin Liwang)